Compact Proximity Aligner for R&D TME-400R
Desktop Proximity Aligner for R&D TME-150R
- A compact proximity aligner for R&D allowing high-precision exposure.
- Available in various fields including prototyping up to mass production of LCDs/organic ELs/micromachines/light guides and resist evaluation.
- Supporting not only wafers but also glasses, ceramics and variety of other substrates.
- A variety of options are provided. You can expand your system to an optimal one as you desired.
| TME-400R | TME-150R | |
|---|---|---|
| Exposure method | Proximity | |
| Resolution | Proximity: 7 micronsL&S Soft contact: 3 micronsL&S (Different corresponding to the conditions) |
Proximity: 6 micronsL&S Soft contact: 2 micronsL&S Hard contact: 0.5 micronsL&S (Different corresponding to the conditions) |
| Available substrate size | Max. 300 × 400mm | 50 to 200mm dia. 40 × 40 to 150 × 150mm |
| Available mask size | Max. 340 × 440mm | 250 × 250mm recommended |
| Illumination unevenness | 5.0% or less | |
| Overlay accuracy | ±1.0 microns (with the automatic alignment used) | |
| Gap setting range | 0 to 500 microns | 0 to 999 microns |
| Mask setting | Manual | |
| Dimensions of the system main unit | 2900(W) × 2300(D) × 1950(H)mm | 1200(W) × 1200(D) × 1700(H)mm |
| Weight of the system main unit | Approx. 4000kg | Approx. 600kg |
| Power supply | 3-phase 200V, 50/60Hz | 3-phase 100V or 200V, 50/60Hz |
